W10 - créé par Benjosium le 13/05/2021
Temps : 5 min
Description :
Lots of buffs/debuffs + Poison damage
Description :
Lots of buffs/debuffs + Poison damage
Shihab
LVL 30
 HP |
13892 (8118) |
|---|---|
 ATK |
1058 (102) |
 DEF |
1146 (560) |
 SPD |
114 (42) |
 CRIT % |
26 % (6 %) |
 CRIT DMG |
184 % (34 %) |
 ACC |
67 % (47 %) |
 RES |
53 % (8 %) |
 EHP
|
61996 |
| DEF |
+39 % |
| HP |
+304 |
| CRIT |
+7 % |
| ACC |
+4 % |
| RES |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
48
Support
48
Debuf.
31
| SPD |
+23 |
| HP |
+2 % |
| ATK |
+34 |
| CRIT |
+10 % |
| ACC |
+2 % |
| SPD |
+6 |
Glyph efficiency
Basic
45
Support
22
Debuf.
39
| DEF |
+175 |
| HP |
+383 |
| % CRIT |
+6 % |
| RES |
+2 % |
| SPD |
+3 |
Glyph efficiency
Basic
44
Support
44
Debuf.
23
| HP |
+59 % |
| DEF |
+40 |
| DEF |
+8 % |
| ATK |
+5 % |
| RES |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
54
Support
59
Debuf.
34
| HP |
+2408 |
| HP |
+3 % |
| DEF |
+20 |
| DEF |
+3 % |
| CRIT |
+6 % |
| SPD |
+4 |
Glyph efficiency
Basic
37
Support
29
Debuf.
42
| ACC |
+19 % |
| HP |
+3 % |
| DEF |
+31 |
| ATK |
+20 |
| CRIT |
+11 % |
| ACC |
+2 % |
Glyph efficiency
Basic
41
Debuf.
35
Suhail
LVL 30
| HP |
14285 (8341) |
|---|---|
| ATK |
1046 (203) |
| DEF |
1089 (496) |
| SPD |
116 (36) |
| CRIT % |
30 % (10 %) |
| CRIT DMG |
176 % (26 %) |
| ACC |
75 % (55 %) |
| RES |
46 % (26 %) |
|
EHP
|
60380 |
| DEF |
+32 % |
| HP |
+3 % |
| CRIT |
+9 % |
| ACC |
+3 % |
| RES |
+2 % |
| SPD |
+5 |
Glyph efficiency
Basic
44
Support
27
Debuf.
41
| SPD |
+26 |
| HP |
+306 |
| DEF |
+15 |
| ATK |
+76 |
| ACC |
+8 % |
Glyph efficiency
Basic
54
Support
28
Debuf.
54
| DEF |
+175 |
| DEF |
+10 |
| ATK |
+35 |
| % CRIT |
+7 % |
| RES |
+4 % |
| SPD |
+2 |
Glyph efficiency
Basic
43
Support
18
Debuf.
23
| HP |
+3577 |
| HP |
+3 % |
| DEF |
+34 |
| ATK |
+8 % |
| CRIT |
+13 % |
| ACC |
+4 % |
Glyph efficiency
Basic
62
Support
22
Debuf.
42
| HP |
+59 % |
| HP |
+8 % |
| DEF |
+54 |
| DEF |
+3 % |
| ATK |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
54
Support
48
Debuf.
59
| RES |
+18 % |
| HP |
+2 % |
| % CRIT |
+3 % |
| CRIT |
+4 % |
| RES |
+2 % |
Glyph efficiency
Basic
22
Support
9
Dion
LVL 30
| HP |
15293 (10349) |
|---|---|
| ATK |
1543 (251) |
| DEF |
1051 (580) |
| SPD |
117 (42) |
| CRIT % |
35 % (10 %) |
| CRIT DMG |
164 % (14 %) |
| ACC |
84 % (34 %) |
| RES |
54 % (44 %) |
|
EHP
|
62292 |
| DEF |
+224 |
| HP |
+163 |
| DEF |
+27 |
| DEF |
+8 % |
| RES |
+8 % |
| SPD |
+4 |
Glyph efficiency
Basic
62
Support
77
Debuf.
54
| SPD |
+21 |
| DEF |
+18 |
| DEF |
+7 % |
| ATK |
+2 % |
| % CRIT |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
39
Support
43
Debuf.
26
| HP |
+4003 |
| ATK |
+57 |
| ATK |
+10 % |
| CRIT |
+7 % |
| ACC |
+9 % |
| RES |
+17 % |
Glyph efficiency
Basic
106
Support
69
Debuf.
25
| HP |
+43 % |
| ACC |
+10 % |
| RES |
+11 % |
| SPD |
+4 |
Glyph efficiency
Basic
63
Support
65
Debuf.
53
| DEF |
+37 % |
| DEF |
+17 |
| DEF |
+5 % |
| ATK |
+3 % |
| ACC |
+11 % |
| RES |
+4 % |
Glyph efficiency
Basic
59
Support
54
Debuf.
59
| HP |
+3068 |
| DEF |
+25 |
| % CRIT |
+7 % |
| CRIT |
+7 % |
| ACC |
+4 % |
| RES |
+4 % |
Glyph efficiency
Basic
56
Support
38
Debuf.
18
Loth
LVL 35
| HP |
11071 (3762) |
|---|---|
| ATK |
1152 (146) |
| DEF |
1402 (533) |
| SPD |
122 (51) |
| CRIT % |
30 % (15 %) |
| CRIT DMG |
156 % (6 %) |
| ACC |
45 % (30 %) |
| RES |
70 % (15 %) |
|
EHP
|
62045 |
| SPD |
+20 |
| HP |
+141 |
| DEF |
+26 |
| ATK |
+36 |
| ATK |
+2 % |
| RES |
+6 % |
Glyph efficiency
Basic
41
Support
45
Debuf.
13
| SPD |
+24 |
| DEF |
+16 |
| DEF |
+4 % |
| ATK |
+3 % |
| % CRIT |
+7 % |
| RES |
+7 % |
Glyph efficiency
Basic
54
Support
46
Debuf.
12
| DEF |
+175 |
| HP |
+227 |
| CRIT |
+6 % |
| ACC |
+2 % |
| SPD |
+2 |
Glyph efficiency
Basic
29
Support
33
Debuf.
20
| DEF |
+175 |
| HP |
+98 |
| DEF |
+15 |
| ATK |
+6 % |
| % CRIT |
+3 % |
| RES |
+2 % |
Glyph efficiency
Basic
34
Support
29
Debuf.
8
| HP |
+3068 |
| HP |
+136 |
| DEF |
+9 % |
| ACC |
+7 % |
Glyph efficiency
Basic
42
Support
48
Debuf.
41
| ACC |
+18 % |
| HP |
+92 |
| DEF |
+13 |
| % CRIT |
+5 % |
| ACC |
+3 % |
| SPD |
+5 |
Glyph efficiency
Basic
41
Debuf.
28
Nessa
LVL 30
| HP |
14324 (8494) |
|---|---|
| ATK |
1269 (288) |
| DEF |
1087 (531) |
| SPD |
127 (54) |
| CRIT % |
31 % (11 %) |
| CRIT DMG |
180 % (30 %) |
| ACC |
51 % (6 %) |
| RES |
37 % (17 %) |
|
EHP
|
60428 |
| SPD |
+24 |
| DEF |
+18 |
| DEF |
+9 % |
| ATK |
+46 |
| CRIT |
+13 % |
| ACC |
+4 % |
Glyph efficiency
Basic
62
Support
44
Debuf.
33
| SPD |
+21 |
| DEF |
+18 |
| % CRIT |
+2 % |
| CRIT |
+4 % |
| ACC |
+2 % |
| RES |
+8 % |
Glyph efficiency
Basic
42
Support
44
Debuf.
11
| HP |
+59 % |
| HP |
+3 % |
| DEF |
+12 % |
| ATK |
+72 |
| ATK |
+5 % |
| % CRIT |
+6 % |
Glyph efficiency
Basic
69
Support
45
Debuf.
27
| HP |
+3577 |
| HP |
+190 |
| HP |
+12 % |
| ATK |
+42 |
| ATK |
+4 % |
| RES |
+7 % |
Glyph efficiency
Basic
66
Support
65
Debuf.
29
| DEF |
+34 % |
| ATK |
+2 % |
| CRIT |
+13 % |
| RES |
+2 % |
Glyph efficiency
Basic
28
Support
20
| DEF |
+34 % |
| HP |
+120 |
| HP |
+5 % |
| ATK |
+2 % |
| % CRIT |
+3 % |
| SPD |
+9 |
Glyph efficiency
Basic
49
Support
53
Debuf.
36