Team inversion poison - créé par Holay le 08/05/2020
Chevalier d'Ébène
LVL 1
 HP |
3435 |
|---|---|
 ATK |
644 |
 DEF |
439 |
 SPD |
72 |
 CRIT % |
15 % |
 CRIT DMG |
150 % |
 ACC |
15 % |
 RES |
30 % |
 EHP
|
6898 |
Daimyo
LVL 1
| HP |
3492 |
|---|---|
| ATK |
650 |
| DEF |
392 |
| SPD |
78 |
| CRIT % |
25 % |
| CRIT DMG |
150 % |
| ACC |
25 % |
| RES |
10 % |
|
EHP
|
6569 |
Dion
LVL 27
| HP |
13646 (8464) |
|---|---|
| ATK |
1619 (263) |
| DEF |
981 (487) |
| SPD |
133 (58) |
| CRIT % |
33 % (8 %) |
| CRIT DMG |
154 % (4 %) |
| ACC |
98 % (48 %) |
| RES |
18 % (8 %) |
|
EHP
|
51829 |
| SPD |
+20 |
| HP |
+5 % |
| % CRIT |
+8 % |
| RES |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
45
Support
25
Debuf.
32
| SPD |
+20 |
| HP |
+126 |
| DEF |
+34 |
| ATK |
+25 |
| ACC |
+5 % |
| RES |
+3 % |
Glyph efficiency
Basic
42
Support
46
Debuf.
44
| DEF |
+216 |
| HP |
+8 % |
| ATK |
+35 |
| ATK |
+4 % |
| ACC |
+3 % |
| SPD |
+7 |
Glyph efficiency
Basic
56
Support
52
Debuf.
55
| HP |
+3099 |
| HP |
+484 |
| HP |
+10 % |
| DEF |
+5 % |
| ACC |
+12 % |
| SPD |
+6 |
Glyph efficiency
Basic
96
Support
81
Debuf.
94
| DEF |
+30 % |
| ATK |
+5 % |
| CRIT |
+4 % |
| ACC |
+4 % |
| RES |
+2 % |
| SPD |
+2 |
Glyph efficiency
Basic
36
Support
15
Debuf.
31
| HP |
+59 % |
| HP |
+506 |
| DEF |
+13 % |
| ATK |
+40 |
| ATK |
+3 % |
| ACC |
+4 % |
Glyph efficiency
Basic
72
Support
53
Debuf.
69
Xari
LVL 35
| HP |
9894 (3853) |
|---|---|
| ATK |
1554 (277) |
| DEF |
940 (372) |
| SPD |
135 (58) |
| CRIT % |
40 % (15 %) |
| CRIT DMG |
156 % (6 %) |
| ACC |
111 % (61 %) |
| RES |
20 % (10 %) |
|
EHP
|
36030 |
| SPD |
+20 |
| HP |
+224 |
| HP |
+3 % |
| ATK |
+41 |
| ATK |
+3 % |
| SPD |
+5 |
Glyph efficiency
Basic
43
Support
28
Debuf.
27
| SPD |
+24 |
| HP |
+409 |
| DEF |
+3 % |
| ATK |
+80 |
| ACC |
+3 % |
| RES |
+3 % |
Glyph efficiency
Basic
55
Support
50
Debuf.
45
| HP |
+36 % |
| DEF |
+3 % |
| ATK |
+29 |
| CRIT |
+6 % |
| ACC |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
35
Support
32
Debuf.
21
| DEF |
+275 |
| HP |
+12 % |
| DEF |
+29 |
| ATK |
+7 % |
| % CRIT |
+10 % |
| ACC |
+16 % |
Glyph efficiency
Basic
113
Dps
1
Support
54
Debuf.
74
| ACC |
+14 % |
| % CRIT |
+3 % |
| ACC |
+5 % |
| RES |
+7 % |
Glyph efficiency
Basic
38
Debuf.
14
| ACC |
+17 % |
| HP |
+139 |
| DEF |
+6 % |
| % CRIT |
+2 % |
| ACC |
+3 % |
| SPD |
+6 |
Glyph efficiency
Basic
46
Debuf.
40
Loth
LVL 30
| HP |
13871 (7464) |
|---|---|
| ATK |
1006 (123) |
| DEF |
1543 (782) |
| SPD |
135 (64) |
| CRIT % |
23 % (8 %) |
| CRIT DMG |
185 % (35 %) |
| ACC |
21 % (6 %) |
| RES |
60 % (5 %) |
|
EHP
|
87256 |
| SPD |
+20 |
| HP |
+133 |
| HP |
+7 % |
| % CRIT |
+4 % |
| ACC |
+3 % |
| SPD |
+6 |
Glyph efficiency
Basic
52
Support
54
Debuf.
56
| DEF |
+37 % |
| HP |
+426 |
| HP |
+4 % |
| CRIT |
+7 % |
| ACC |
+3 % |
| SPD |
+7 |
Glyph efficiency
Basic
62
Support
48
Debuf.
50
| DEF |
+169 |
| DEF |
+32 |
| DEF |
+2 % |
| ATK |
+49 |
| RES |
+2 % |
| SPD |
+4 |
Glyph efficiency
Basic
40
Support
45
Debuf.
38
| HP |
+2760 |
| HP |
+225 |
| ATK |
+3 % |
| CRIT |
+14 % |
| RES |
+3 % |
| SPD |
+7 |
Glyph efficiency
Basic
61
Support
35
Debuf.
26
| HP |
+2760 |
| HP |
+136 |
| HP |
+5 % |
| % CRIT |
+4 % |
| CRIT |
+14 % |
| SPD |
+7 |
Glyph efficiency
Basic
64
Support
34
Debuf.
47
| DEF |
+30 % |
| DEF |
+41 |
| DEF |
+2 % |
| ATK |
+30 |
| ATK |
+2 % |
| SPD |
+3 |
Glyph efficiency
Basic
35
Support
40
Debuf.
38