ToT 60 - créé par Kazu le 15/06/2020
Description :
Focus Rachel
Focus Rachel
Ulagan
LVL 30
 HP |
11640 (5609) |
|---|---|
 ATK |
1288 (326) |
 DEF |
1263 (596) |
 SPD |
116 (55) |
 CRIT % |
19 % (4 %) |
 CRIT DMG |
159 % (9 %) |
 ACC |
30 % (15 %) |
 RES |
58 % (3 %) |
 EHP
|
57825 |
| SPD |
+20 |
| DEF |
+10 |
| CRIT |
+5 % |
| ACC |
+6 % |
| RES |
+3 % |
Glyph efficiency
Basic
33
Support
33
Debuf.
19
| SPD |
+20 |
| DEF |
+17 |
| DEF |
+3 % |
| ATK |
+33 |
| ATK |
+3 % |
| CRIT |
+4 % |
Glyph efficiency
Basic
30
Support
27
Debuf.
11
| HP |
+31 % |
| HP |
+167 |
| ATK |
+37 |
| ATK |
+9 % |
| ACC |
+3 % |
| SPD |
+4 |
Glyph efficiency
Basic
50
Support
36
Debuf.
25
| DEF |
+169 |
| HP |
+194 |
| HP |
+2 % |
| ATK |
+21 |
| ACC |
+2 % |
| SPD |
+6 |
Glyph efficiency
Basic
37
Support
45
Debuf.
32
| DEF |
+32 % |
| HP |
+3 % |
| DEF |
+2 % |
| ATK |
+32 |
| SPD |
+2 |
Glyph efficiency
Basic
21
Support
30
Debuf.
14
| HP |
+31 % |
| DEF |
+21 |
| ATK |
+87 |
| % CRIT |
+4 % |
| ACC |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
52
Support
35
Debuf.
25
Venusia
LVL 35
| HP |
8176 (1610) |
|---|---|
| ATK |
3560 (2016) |
| DEF |
602 (143) |
| SPD |
117 (43) |
| CRIT % |
77 % (47 %) |
| CRIT DMG |
287 % (87 %) |
| ACC |
22 % (7 %) |
| RES |
33 % (18 %) |
|
EHP
|
20302 |
| ATK |
+37 % |
| ATK |
+29 |
| ATK |
+12 % |
| ACC |
+3 % |
| RES |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
52
Dps
40
| SPD |
+24 |
| HP |
+5 % |
| DEF |
+7 % |
| ATK |
+78 |
| RES |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
55
Support
39
Debuf.
29
| CRIT |
+60 % |
| HP |
+194 |
| DEF |
+8 % |
| ATK |
+62 |
| ATK |
+12 % |
| % CRIT |
+9 % |
Glyph efficiency
Basic
83
Dps
84
| % CRIT |
+23 % |
| DEF |
+8 % |
| ATK |
+5 % |
| CRIT |
+13 % |
| ACC |
+4 % |
| RES |
+7 % |
Glyph efficiency
Basic
72
Dps
32
| ATK |
+391 |
| HP |
+79 |
| HP |
+4 % |
| DEF |
+8 % |
| % CRIT |
+5 % |
| RES |
+2 % |
Glyph efficiency
Basic
45
Dps
31
| ATK |
+438 |
| HP |
+221 |
| HP |
+8 % |
| CRIT |
+14 % |
| RES |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
61
Dps
25
Drostan
LVL 35
| HP |
21233 (13965) |
|---|---|
| ATK |
1260 (72) |
| DEF |
1139 (438) |
| SPD |
122 (49) |
| CRIT % |
34 % (14 %) |
| CRIT DMG |
160 % (10 %) |
| ACC |
26 % (6 %) |
| RES |
65 % (20 %) |
|
EHP
|
94133 |
| HP |
+2286 |
| HP |
+4 % |
| DEF |
+28 |
| ATK |
+3 % |
| RES |
+2 % |
| SPD |
+5 |
Glyph efficiency
Basic
41
Support
50
Debuf.
43
| SPD |
+20 |
| % CRIT |
+2 % |
| CRIT |
+4 % |
| ACC |
+3 % |
| RES |
+2 % |
| SPD |
+2 |
Glyph efficiency
Basic
28
Support
29
Debuf.
28
| DEF |
+216 |
| HP |
+4 % |
| DEF |
+29 |
| CRIT |
+6 % |
| RES |
+3 % |
| SPD |
+10 |
Glyph efficiency
Basic
59
Support
65
Debuf.
56
| HP |
+4003 |
| HP |
+809 |
| HP |
+10 % |
| DEF |
+13 % |
| % CRIT |
+4 % |
| RES |
+10 % |
Glyph efficiency
Basic
117
Support
122
Debuf.
73
| HP |
+2286 |
| HP |
+149 |
| DEF |
+32 |
| DEF |
+6 % |
| % CRIT |
+4 % |
| SPD |
+2 |
Glyph efficiency
Basic
44
Support
49
Debuf.
31
| HP |
+2760 |
| HP |
+5 % |
| ATK |
+3 % |
| % CRIT |
+4 % |
| ACC |
+3 % |
| RES |
+3 % |
Glyph efficiency
Basic
41
Support
36
Debuf.
17
Dion
LVL 35
| HP |
21640 (16013) |
|---|---|
| ATK |
1844 (368) |
| DEF |
1028 (492) |
| SPD |
130 (55) |
| CRIT % |
36 % (11 %) |
| CRIT DMG |
181 % (31 %) |
| ACC |
107 % (56 %) |
| RES |
22 % (12 %) |
|
EHP
|
86165 |
| HP |
+3577 |
| HP |
+4 % |
| DEF |
+47 |
| ATK |
+86 |
| RES |
+8 % |
| SPD |
+7 |
Glyph efficiency
Basic
78
Support
61
Debuf.
54
| SPD |
+27 |
| HP |
+215 |
| HP |
+10 % |
| DEF |
+55 |
| DEF |
+3 % |
| CRIT |
+13 % |
Glyph efficiency
Basic
72
Support
54
Debuf.
63
| HP |
+3577 |
| DEF |
+19 |
| DEF |
+9 % |
| % CRIT |
+4 % |
| ACC |
+10 % |
| SPD |
+10 |
Glyph efficiency
Basic
84
Support
62
Debuf.
89
| DEF |
+265 |
| HP |
+5 % |
| DEF |
+4 % |
| ATK |
+15 % |
| % CRIT |
+7 % |
| RES |
+4 % |
Glyph efficiency
Basic
76
Dps
12
Support
28
Debuf.
31
| HP |
+59 % |
| HP |
+7 % |
| DEF |
+4 % |
| CRIT |
+12 % |
| ACC |
+6 % |
| SPD |
+4 |
Glyph efficiency
Basic
64
Support
40
Debuf.
61
| HP |
+59 % |
| HP |
+372 |
| HP |
+3 % |
| ATK |
+61 |
| CRIT |
+6 % |
| SPD |
+7 |
Glyph efficiency
Basic
61
Support
40
Debuf.
53
Ibor
LVL 35
| HP |
21193 (11708) |
|---|---|
| ATK |
1122 (174) |
| DEF |
1204 (681) |
| SPD |
133 (70) |
| CRIT % |
22 % (7 %) |
| CRIT DMG |
187 % (37 %) |
| ACC |
34 % (19 %) |
| RES |
90 % (35 %) |
|
EHP
|
99810 |
| SPD |
+27 |
| HP |
+578 |
| HP |
+4 % |
| CRIT |
+6 % |
| ACC |
+7 % |
| RES |
+3 % |
Glyph efficiency
Basic
67
Support
65
Debuf.
49
| SPD |
+24 |
| HP |
+5 % |
| DEF |
+43 |
| ATK |
+6 % |
| % CRIT |
+3 % |
| ACC |
+4 % |
Glyph efficiency
Basic
54
Support
44
Debuf.
33
| HP |
+59 % |
| HP |
+3 % |
| % CRIT |
+4 % |
| RES |
+14 % |
| SPD |
+8 |
Glyph efficiency
Basic
71
Support
76
Debuf.
25
| DEF |
+265 |
| HP |
+7 % |
| DEF |
+19 |
| DEF |
+3 % |
| CRIT |
+19 % |
| RES |
+11 % |
Glyph efficiency
Basic
81
Support
69
Debuf.
24
| HP |
+3577 |
| HP |
+155 |
| ATK |
+81 |
| ACC |
+4 % |
| RES |
+3 % |
| SPD |
+11 |
Glyph efficiency
Basic
68
Support
62
Debuf.
45
| DEF |
+49 % |
| DEF |
+82 |
| ATK |
+36 |
| CRIT |
+12 % |
| ACC |
+4 % |
| RES |
+4 % |
Glyph efficiency
Basic
72
Support
57
Debuf.
36