La mine d'ambre - 4 étoiles : Stage 3 - créé par SpitLoki le 17/02/2020
Rachel
LVL 35
 HP |
25405 (18075) |
|---|---|
 ATK |
1467 (231) |
 DEF |
1690 (1012) |
 SPD |
105 (32) |
 CRIT % |
42 % (22 %) |
 CRIT DMG |
176 % (26 %) |
 ACC |
43 % (23 %) |
 RES |
62 % (17 %) |
 EHP
|
179088 |
| HP |
+3577 |
| HP |
+202 |
| DEF |
+22 |
| DEF |
+9 % |
| % CRIT |
+8 % |
| RES |
+7 % |
Glyph efficiency
Basic
72
Support
67
Debuf.
31
| DEF |
+49 % |
| DEF |
+6 % |
| ATK |
+10 % |
| ACC |
+7 % |
| RES |
+7 % |
| SPD |
+3 |
Glyph efficiency
Basic
75
Support
61
Debuf.
38
| HP |
+59 % |
| DEF |
+5 % |
| ATK |
+5 % |
| % CRIT |
+4 % |
| RES |
+3 % |
| SPD |
+3 |
Glyph efficiency
Basic
45
Support
40
Debuf.
17
| HP |
+59 % |
| DEF |
+22 |
| DEF |
+5 % |
| % CRIT |
+3 % |
| CRIT |
+19 % |
| SPD |
+11 |
Glyph efficiency
Basic
80
Support
60
Debuf.
58
| HP |
+59 % |
| HP |
+160 |
| HP |
+6 % |
| DEF |
+52 |
| % CRIT |
+7 % |
| ACC |
+6 % |
Glyph efficiency
Basic
69
Support
59
Debuf.
64
| DEF |
+61 % |
| HP |
+721 |
| ATK |
+45 |
| CRIT |
+7 % |
| ACC |
+10 % |
| SPD |
+15 |
Glyph efficiency
Basic
113
Support
97
Debuf.
108
Nakoruru d'eau
LVL 35
| HP |
21342 (14807) |
|---|---|
| ATK |
1769 (441) |
| DEF |
1933 (1255) |
| SPD |
110 (31) |
| CRIT % |
52 % (22 %) |
| CRIT DMG |
157 % (7 %) |
| ACC |
44 % (29 %) |
| RES |
41 % (26 %) |
|
EHP
|
179292 |
| DEF |
+49 % |
| HP |
+207 |
| DEF |
+8 % |
| ATK |
+74 |
| ATK |
+4 % |
| RES |
+11 % |
Glyph efficiency
Basic
75
Support
68
Debuf.
38
| DEF |
+49 % |
| HP |
+471 |
| DEF |
+4 % |
| ATK |
+75 |
| ACC |
+4 % |
| SPD |
+6 |
Glyph efficiency
Basic
69
Support
64
Debuf.
67
| HP |
+59 % |
| HP |
+326 |
| % CRIT |
+11 % |
| ACC |
+3 % |
| RES |
+11 % |
| SPD |
+4 |
Glyph efficiency
Basic
87
Support
71
Debuf.
46
| HP |
+69 % |
| HP |
+714 |
| DEF |
+56 |
| ATK |
+35 |
| ACC |
+12 % |
| SPD |
+6 |
Glyph efficiency
Basic
102
Support
95
Debuf.
108
| HP |
+59 % |
| HP |
+147 |
| DEF |
+3 % |
| ATK |
+12 % |
| % CRIT |
+11 % |
| RES |
+4 % |
Glyph efficiency
Basic
74
Dps
2
Support
37
Debuf.
26
| DEF |
+64 % |
| HP |
+721 |
| ATK |
+45 |
| CRIT |
+7 % |
| ACC |
+10 % |
| SPD |
+15 |
Glyph efficiency
Basic
113
Support
97
Debuf.
108
Cyrrus
LVL 35
| HP |
15465 (8976) |
|---|---|
| ATK |
1548 (333) |
| DEF |
1620 (883) |
| SPD |
118 (39) |
| CRIT % |
36 % (11 %) |
| CRIT DMG |
164 % (14 %) |
| ACC |
147 % (96 %) |
| RES |
29 % (19 %) |
|
EHP
|
103344 |
| SPD |
+27 |
| HP |
+360 |
| ATK |
+9 % |
| CRIT |
+7 % |
| ACC |
+7 % |
| SPD |
+3 |
Glyph efficiency
Basic
69
Support
32
Debuf.
56
| DEF |
+49 % |
| DEF |
+34 |
| % CRIT |
+4 % |
| ACC |
+7 % |
| RES |
+4 % |
| SPD |
+6 |
Glyph efficiency
Basic
64
Support
45
Debuf.
59
| HP |
+59 % |
| % CRIT |
+4 % |
| CRIT |
+7 % |
| ACC |
+4 % |
| RES |
+4 % |
| SPD |
+3 |
Glyph efficiency
Basic
48
Support
23
Debuf.
34
| HP |
+59 % |
| HP |
+122 |
| HP |
+4 % |
| DEF |
+3 % |
| ATK |
+64 |
| ACC |
+12 % |
Glyph efficiency
Basic
62
Support
34
Debuf.
65
| DEF |
+49 % |
| HP |
+316 |
| HP |
+4 % |
| DEF |
+8 % |
| % CRIT |
+3 % |
| RES |
+8 % |
Glyph efficiency
Basic
65
Support
58
Debuf.
49
| ACC |
+23 % |
| DEF |
+46 |
| ATK |
+75 |
| ATK |
+7 % |
| ACC |
+3 % |
| RES |
+3 % |
Glyph efficiency
Basic
59
Debuf.
37
Neas
LVL 35
| HP |
17996 (10621) |
|---|---|
| ATK |
1830 (585) |
| DEF |
1309 (632) |
| SPD |
127 (54) |
| CRIT % |
47 % (27 %) |
| CRIT DMG |
150 % |
| ACC |
38 % (18 %) |
| RES |
92 % (47 %) |
|
EHP
|
93112 |
| SPD |
+27 |
| HP |
+155 |
| DEF |
+76 |
| ATK |
+4 % |
| % CRIT |
+3 % |
Glyph efficiency
Basic
48
Support
47
Debuf.
29
| SPD |
+27 |
| HP |
+4 % |
| DEF |
+71 |
| DEF |
+5 % |
| % CRIT |
+3 % |
| RES |
+3 % |
Glyph efficiency
Basic
57
Support
64
Debuf.
38
| HP |
+59 % |
| HP |
+215 |
| DEF |
+68 |
| ATK |
+42 |
| RES |
+4 % |
Glyph efficiency
Basic
51
Support
57
Debuf.
29
| HP |
+59 % |
| HP |
+5 % |
| DEF |
+51 |
| ATK |
+11 % |
| ACC |
+10 % |
Glyph efficiency
Basic
74
Support
55
Debuf.
52
| RES |
+25 % |
| HP |
+12 % |
| ATK |
+14 % |
| % CRIT |
+10 % |
| ACC |
+5 % |
| RES |
+12 % |
Glyph efficiency
Basic
120
Dps
3
Support
75
| DEF |
+49 % |
| ATK |
+120 |
| ATK |
+5 % |
| % CRIT |
+11 % |
| ACC |
+3 % |
| RES |
+3 % |
Glyph efficiency
Basic
77
Dps
12
Support
26
Debuf.
8
Loth
LVL 35
| HP |
26521 (19212) |
|---|---|
| ATK |
1438 (432) |
| DEF |
1047 (178) |
| SPD |
153 (82) |
| CRIT % |
35 % (19 %) |
| CRIT DMG |
197 % (47 %) |
| ACC |
25 % (10 %) |
| RES |
69 % (14 %) |
|
EHP
|
107602 |
| SPD |
+27 |
| HP |
+281 |
| DEF |
+62 |
| ATK |
+76 |
| ATK |
+5 % |
| SPD |
+7 |
Glyph efficiency
Basic
76
Support
65
Debuf.
47
| SPD |
+27 |
| DEF |
+28 |
| ATK |
+29 |
| ATK |
+4 % |
| % CRIT |
+12 % |
| CRIT |
+14 % |
Glyph efficiency
Basic
73
Dps
14
Support
24
Debuf.
23
| HP |
+59 % |
| HP |
+5 % |
| DEF |
+53 |
| % CRIT |
+7 % |
| CRIT |
+14 % |
| SPD |
+3 |
Glyph efficiency
Basic
73
Support
50
Debuf.
47
| HP |
+59 % |
| HP |
+5 % |
| DEF |
+4 % |
| CRIT |
+13 % |
| ACC |
+6 % |
| RES |
+3 % |
Glyph efficiency
Basic
59
Support
48
Debuf.
48
| HP |
+59 % |
| HP |
+222 |
| ATK |
+76 |
| ATK |
+5 % |
| RES |
+7 % |
| SPD |
+8 |
Glyph efficiency
Basic
72
Support
62
Debuf.
29
| HP |
+59 % |
| HP |
+10 % |
| ATK |
+11 % |
| CRIT |
+6 % |
| ACC |
+4 % |
| RES |
+4 % |
Glyph efficiency
Basic
71
Support
50
Debuf.
29